cvd process meaning in Chinese

化学气相沉积

Analysis on the cvd processes for mosi2 coatings
2涂层分析
V - class thermistor film is successfully produced on silicon substrate and sio2 substrate applying cvd process for the first time in this paper , whose minimum thickness is only 600nm or so
本论文创沃性地采用十导体cvd工艺在硅中晶1底以及引；衬底1二if长出最小厚度为600urn的v系热敏电阻薄脏。